- AutorIn
- R. Kirchner Institute of Semiconductors and Microsystems, Technische Universität Dresden
- R. Hoekstra
- N. Chidambaram
- H. Schift
- Titel
- Depth-profiling of vertical material contrast after VUV exposure for contact-free polishing of 3D polymer micro-optics
- Zitierfähige Url:
- https://nbn-resolving.org/urn:nbn:de:bsz:14-qucosa2-349864
- Konferenz
- 33rd European Mask and Lithography Conference. Dresden, 26.-28. June 2017
- Quellenangabe
- 33rd European Mask and Lithography Conference
Herausgeber: Uwe F.W. Behringer
Herausgeber: Jo Finders
Erscheinungsort: Bellingham, Wash.
Verlag: SPIE
Erscheinungsjahr: 2017
Titel Schriftenreihe: Proceedings of SPIE
Bandnummer Schriftenreihe: 10446 - Erstveröffentlichung
- 2017
- Abstract (EN)
- We characterize the impact of high-energy, 172 nm vacuum ultraviolet photons on the molecular weight and the glass transition temperature of poly(methyl methacrylate). We found that the molecular weight is reduced strongly on the surface of the exposed samples with a continuous transition towards the unexposed bulk material being located below the modified region. The glass transition temperature was found to be significantly lowered in the exposed region to well below 50°C compared to that of the 122°C of the bulk region. We could use this material contrast to selectively reflow the top surface of the exposed samples only. This allowed us to create ultra-smooth micro-optical structures by postprocessing without influencing the overall geometry that is required for the optical functionality.
- Andere Ausgabe
- Link zum Artikel, der zuerst in der Zeitschrift 'Proceedings of SPIE' erschienen ist.
DOI: 10.1117/12.2279712 - Freie Schlagwörter (DE)
- Glasübergang, Molekulargewicht, Kettenspaltung, thermische Ausdehnung, Reflow, Multi-Photonen-Lithographie
- Freie Schlagwörter (EN)
- glass transition, molecular weight, chain scission, thermal expansion, reflow, multi-photon lithography
- Klassifikation (DDC)
- 620
- Verlag
- SPIE, Bellingham, Wash.
- Förder- / Projektangaben
- Swiss Nanoscience Institute SurfFlow
ID: A10.13 - Version / Begutachtungsstatus
- publizierte Version / Verlagsversion
- URN Qucosa
- urn:nbn:de:bsz:14-qucosa2-349864
- Veröffentlichungsdatum Qucosa
- 14.08.2019
- Dokumenttyp
- Konferenzbeitrag
- Sprache des Dokumentes
- Englisch
- Lizenz / Rechtehinweis